- **Final Polishing for UPW Systems**: - Removes sub-micron particles and ionic contaminants using **0.1–0.2 μm membrane filters** (e.g., PVDF, PES). - Prevents wafer defects in rinsing and etching processes. - **Point-of-Use (POU) Filtration**: - Ensures particle-free water for photolithography and chemical mechanical planarization (CMP). --- ### **2. High-Purity Chemical Filtration** - **Acids & Solvents (Wet Process Chemicals)**: - Filters for **HCl, H₂SO₄, HF, and photoresist strippers** (using PTFE or PP cartridges). - Prevents particle-induced defects in etching and cleaning. - **CMP Slurry Filtration**: - **1–5 μm filters** maintain uniform abrasive particle size for planarization.

1. Drinking Water & Potable Water Purification** - **Sediment Filtration**: - Removes sand, rust, silt, and suspended solids using **polypropylene (PP) depth filters** (1–100 μm). - **Activated Carbon Filtration**: - Eliminates chlorine, organic compounds, bad tastes, and odors. - **Microbial & Pathogen Removal**: - **Sterile-grade filters** (0.2 μm) for final polishing in point-of-use systems.

Removing bacteria, mycoplasma, and viruses from injectables (e.g., vaccines, IV fluids) using **0.2 μm or 0.1 μm sterilizing-grade membranes** (e.g., PES, PVDF). - Ensuring compliance with **USP <797>**, **EU GMP**, and **FDA** requirements. - **Biopharmaceutical Processing**: - Clarifying cell culture media, monoclonal antibodies (mAbs), and recombinant proteins

Removing particulates, sediments, and haze from juices, beer, wine, and soft drinks. Polishing syrups, edible oils, and dairy products (e.g., milk, whey) for clarity.